Title:
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
Document Type and Number:
Japanese Patent JP2022053516
Kind Code:
A
Abstract:
To provide photoresist compositions and pattern formation methods.SOLUTION: A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent.SELECTED DRAWING: None
Inventors:
KE YANG
EMAD AQAD
JAMES F CAMERON
SUZANNE M COLEY
MANIBARSHA GOSWAMI
LEE CHOONG-BONG
BHOOSHAN POPERE
JAMES W THACKERAY
BRANDON WENNING
EMAD AQAD
JAMES F CAMERON
SUZANNE M COLEY
MANIBARSHA GOSWAMI
LEE CHOONG-BONG
BHOOSHAN POPERE
JAMES W THACKERAY
BRANDON WENNING
Application Number:
JP2021152791A
Publication Date:
April 05, 2022
Filing Date:
September 21, 2021
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/039; C08F212/14; C08F220/10; G03F7/004; G03F7/20
Domestic Patent References:
| JP2015143819A | 2015-08-06 | |||
| JP2017214480A | 2017-12-07 | |||
| JP2010138383A | 2010-06-24 |
Foreign References:
| WO2020066342A1 | 2020-04-02 | |||
| WO2018070327A1 | 2018-04-19 | |||
| WO2016035497A1 | 2016-03-10 | |||
| US6365321B1 | 2002-04-02 | |||
| CN103387636A | 2013-11-13 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office
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