Title:
PHOTORESIST COMPRISING IONIC COMPOUND
Document Type and Number:
Japanese Patent JP2014123105
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide new photoresist compositions that comprise a component comprising a radiation-insensitive ionic compound.SOLUTION: Photoresists of the invention may comprise: a resin that comprises photoacid-labile groups; a photoacid generator compound; and a radiation-insensitive ionic compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
Inventors:
GERHARD POHLERS
LIU KONG
CHENG BAI SU
WOO CHU NI
LIU KONG
CHENG BAI SU
WOO CHU NI
Application Number:
JP2013221920A
Publication Date:
July 03, 2014
Filing Date:
October 25, 2013
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/004; G03F7/039; C07C211/63; C07C307/02
Domestic Patent References:
JP2008158339A | 2008-07-10 | |||
JP2010160446A | 2010-07-22 | |||
JP2012137750A | 2012-07-19 | |||
JP2001330956A | 2001-11-30 | |||
JP2003295439A | 2003-10-15 | |||
JP2011180585A | 2011-09-15 | |||
JP2013068927A | 2013-04-18 | |||
JP2010175608A | 2010-08-12 |
Foreign References:
US5914219A | 1999-06-22 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office