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Title:
PHOTORESIST COMPRISING IONIC COMPOUND
Document Type and Number:
Japanese Patent JP2014123105
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide new photoresist compositions that comprise a component comprising a radiation-insensitive ionic compound.SOLUTION: Photoresists of the invention may comprise: a resin that comprises photoacid-labile groups; a photoacid generator compound; and a radiation-insensitive ionic compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.

Inventors:
GERHARD POHLERS
LIU KONG
CHENG BAI SU
WOO CHU NI
Application Number:
JP2013221920A
Publication Date:
July 03, 2014
Filing Date:
October 25, 2013
Export Citation:
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Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/004; G03F7/039; C07C211/63; C07C307/02
Domestic Patent References:
JP2008158339A2008-07-10
JP2010160446A2010-07-22
JP2012137750A2012-07-19
JP2001330956A2001-11-30
JP2003295439A2003-10-15
JP2011180585A2011-09-15
JP2013068927A2013-04-18
JP2010175608A2010-08-12
Foreign References:
US5914219A1999-06-22
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office



 
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