Title:
Photoresist constituent
Document Type and Number:
Japanese Patent JP6052283
Kind Code:
B2
Abstract:
A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A− represents —SO3− or —CO2−. M+ represents a monovalent onium cation.
Inventors:
Ikui Junto
Norihiko Ikeda
Mineki Kawakami
Norihiko Ikeda
Mineki Kawakami
Application Number:
JP2014506104A
Publication Date:
December 27, 2016
Filing Date:
February 27, 2013
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
G03F7/004; C07C303/20; C07C309/17; C07D207/416; C07D211/46; C07D237/04; C07D237/16; C07D295/18; C07D307/33; C07D307/64; C07D307/93; C07D307/94; C07D311/74; C07D313/06; C07D317/24; C07D319/06; C07D321/12; C07D327/04; C07D493/10; C09K3/00; G03F7/039
Domestic Patent References:
| JP10010715A | ||||
| JP2010111653A | ||||
| JP2011138060A | ||||
| JP2009209248A |
Foreign References:
| WO2011030737A1 | ||||
| WO2012020627A1 |
Attorney, Agent or Firm:
Hajime Amano