Title:
フォトレジスト架橋単量体、フォトレジスト架橋剤、フォトレジスト組成物、フォトレジストパターン形成方法、及び半導体素子
Document Type and Number:
Japanese Patent JP4213838
Kind Code:
B2
Abstract:
The present invention is directed to photoresist cross-linkers selected from the group consisting of a cross-linker monomer represented by following Chemical Formula 1, and homopolymers and copolymers thereof. Such cross-linkers are suitable for use in photolithography processes employing KrF(248nm), ArF(193nm), E-beam, ion-beam or EUV light sources.whereinX1 and X2 individually represent CH2, CH2CH2, O or S; p and s individually represent an integer from 0 to 5; q is 0 or 1; R' and R'' independently represent hydrogen or methyl; R represents straight or branched C1-10 alkyl, straight or branched C1-10 ether, straight or branched C1-10 ester, straight or branched C1-10 ketone, straight or branched C1-10 carboxylic acid, straight or branched C1-10 acetal, straight or branched C1-10 alkyl including at least one hydroxyl group, straight or branched C1-10 ether including at least one hydroxyl group, straight or branched C1-10 ester including at least one hydroxyl group, straight or branched C1-10 ketone including at least one hydroxyl group, straight or branched C1-10 carboxylic acid including at least one hydroxyl group, and straight or branched C1-10 acetal including at least one hydroxyl group; R1 and R2 independently represent hydrogen, straight or branched C1-10 alkyl, straight or branched C1-10 ester, straight or branched C1-10 ketone, straight or branched C1-10 carboxylic acid, straight or branched C1-10 acetal, straight or branched C1-10 alkyl including at least one hydroxyl group, straight or branched C1-10 ester including at least one hydroxyl group, straight or branched C1-10 ketone including at least one hydroxyl group, straight or branched C1-10 carboxylic acid including at least one hydroxyl group, and straight or branched C1-10 acetal including at least one hydroxyl group.
Inventors:
Root root Kei
Chung Zhao Chang
Kim Ming-soo
Kin Toki
Kim Hidehide
White base ho
Chung Zhao Chang
Kim Ming-soo
Kin Toki
Kim Hidehide
White base ho
Application Number:
JP2000043101A
Publication Date:
January 21, 2009
Filing Date:
February 21, 2000
Export Citation:
Assignee:
HYNIX SEMICONDUCTOR INC.
International Classes:
C07D317/22; C07D319/06; C08F32/08; C08K5/156; C08L101/00; G03F7/004; G03F7/032; G03F7/038; G03F7/30; G03F7/32
Domestic Patent References:
| JP11242337A | ||||
| JP11263754A | ||||
| JP2002206009A |
Attorney, Agent or Firm:
Hiroshi Arafune
Yoshio Arafune
Yoshio Arafune