PHOTORESIST MONOMER AND ITS PREPARING METHOD, PHOTORESIST COMPOLYMER AND ITS PREPARING METHOD, PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIST PATTERN, AND SEMICONDUCTOR ELEMENT

Title:

PHOTORESIST MONOMER AND ITS PREPARING METHOD, PHOTORESIST COMPOLYMER AND ITS PREPARING METHOD, PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIST PATTERN, AND SEMICONDUCTOR ELEMENT

Document Type and Number:

Japanese Patent JP3536015

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide novel photoresist substances which can be used in the region of far ultraviolet rays.
SOLUTION: Photoresist compositions comprise a bisnor-bornene carboxylate represented by the formula or a polymer containing a bis(norbornene dicarboxylate) compound, and not only have excellent etching resistance and heat resistance but also can dramatically improve the resolving power and profile of the resist.

Inventors:

Jung, Min HO.
Jung, Jae Chang
Lee, Geun SU.
Baik KI. HO.

Application Number:

JP2000227522A

Publication Date:

June 07, 2004

Filing Date:

July 27, 2000

Export Citation:

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Assignee:

HYUNDAI ELECTRONICS IND CO LTD

International Classes:

C07B61/00; C07C67/04; C07C69/753; C08F32/08; C08F232/04; C08K5/42; C08K5/521; C08K5/59; C08L45/00; G03F7/039; H01L21/027; G03F7/004; (IPC1-7): C08F232/04; C07C67/04; C07C69/753; C08K5/42; C08K5/521; C08K5/59; C08L45/00; G03F7/039; H01L21/027

Attorney, Agent or Firm:

荒船博司（外１名）

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