PURPOSE: To obtain a photoresist peeling agent good in stability and superior in peeling performance and especially, giving hardly an adverse influence to metallic materials in manufacturing printed circuits by using methylene chloride, alcohol, and dichloroethane as essential components.

CONSTITUTION: The photoresist peeling agent contains the mixture of methylene chloride and alcohol in an amt. of ≥90wt%, preferably, ≥95wt%, e.g., in a methylene chloride:methanol wt. ratio of about 13:1 or when isopropanol is used in place of methanol as alcohol, in a methylene chloride:isopropanol wt. ratio of about 12:1, each having an azeotropic compsn. Further, 1,2-dichloroethane is mixed with said azeotropic mixture in an amt. of 0.2W7wt% as an essential component, thus permitting the obtained peeling agent to be incombustible, low in toxicity, and high in peeling speed, and it does not adversely affect plating metallic materials to be used for printed circuits in manufacturing them.