Title:
光感応性酸発生剤およびそれらを含むフォトレジスト
Document Type and Number:
Japanese Patent JP5184129
Kind Code:
B2
Abstract:
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an alpha,alpha-difluoroalkyl sulfonic acid upon exposure to activating radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are particularly preferred. The invention also includes methods for synthesis of such PAGs and alpha,alpha-difluoroalkyl sulfonic acids.
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Inventors:
James F Cameron
Thomas M Zidowski
Thomas M Zidowski
Application Number:
JP2008032677A
Publication Date:
April 17, 2013
Filing Date:
February 14, 2008
Export Citation:
Assignee:
Rohm and Haas Electronic Materials, L.L.C.
International Classes:
C07C303/20; C07B61/00; C07C17/263; C07C22/08; C07C303/32; C07C309/24; C07C381/12; C09K3/00; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| JP2169560A | ||||
| JP7304726A | ||||
| JP5500363A | ||||
| JP59184152A | ||||
| JP10130178A | ||||
| JP6213855A |
Attorney, Agent or Firm:
Norio Saeki