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Title:
PHOTOSENSITIVE ADHESIVE RESIN COMPOSITION, ADHESIVE FILM AND LIGHT-RECEIVING DEVICE
Document Type and Number:
Japanese Patent JP2009009110
Kind Code:
A
Abstract:

To provide a photosensitive adhesive resin composition having excellent developability and being used for producing a spacer which is arranged between a transparent substrate and a substrate on which a semiconductor element is mounted, and an adhesive film and a light-receiving device using the same.

The photosensitive adhesive resin composition contains a compound (A) having a hydroxyl group or carboxyl group and a (meth)acryloyl group; a compound (B) thermosettingly reactive with the compound (A) having a hydroxyl group or carboxyl group and a (meth)acryloyl group; a compound (C) having a (meth)acryloyl group but not having a hydroxyl group and a carboxyl group; a phenol resin or phenol (D); and a sensitizer (E).


Inventors:
TAKAYAMA RIE
TAKAHASHI TOYOSEI
Application Number:
JP2008130328A
Publication Date:
January 15, 2009
Filing Date:
May 19, 2008
Export Citation:
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Assignee:
SUMITOMO BAKELITE CO
International Classes:
G03F7/027; C09J4/02; C09J7/35; C09J11/04; C09J11/06; C09J161/06; C09J163/00; C09J201/00; G03F7/004; G03F7/038
Domestic Patent References:
JPH10330595A1998-12-15
JP2004198673A2004-07-15
JP2004063992A2004-02-26
JPH11184087A1999-07-09
JP2005037754A2005-02-10
JPH09258442A1997-10-03
JPH06216535A1994-08-05
JP2004323811A2004-11-18
JP2008133331A2008-06-12