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Title:
PHOTOSENSITIVE COMPOSITION AND LITHOGRAPHIC PRINTING PLATE OBTAINED BY USING POSITIVE PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP2000098596
Kind Code:
A
Abstract:

To obtain the photosensitive composition capable of judging a proper exposure and setting exact exposure and the photosensitive material using this composition by incorporating a quinonediazide compound and an alkali- soluble resin and specified photodecolorizable dye.

This photosensitive composition contains at least the quinonediazide compound and the alkali-soluble reins and the photodecolorizable dye represented by the formula in which each of Z1-Z3 is a C or N atom; each of R1-R3 is an H atom or a substituent; and X+ is an organic cation. The photodecolorizable dye like this is preferable for this positive photosensitive material. This dye has a high light-absorbance and therefore, density difference due to exposure degree is high, namely, this dye is high in visual discriminability of the density difference after exposure and since the image visualized by exposure in preferable, it can be used for the positive photosensitive composition and the lithographic printing plate by using this composition, and photoresist.


Inventors:
YAMADA TAKETOSHI
NAKAYAMA NORITAKA
Application Number:
JP27351198A
Publication Date:
April 07, 2000
Filing Date:
September 28, 1998
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
International Classes:
G03F7/004; C08K5/16; C08L101/00; C09B23/00; C09D201/00; G03F7/00; G03F7/022; (IPC1-7): G03F7/004; C08K5/16; C08L101/00; C09B23/00; C09D201/00; G03F7/00; G03F7/022