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Title:
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
Japanese Patent JPH05323596
Kind Code:
A
Abstract:

PURPOSE: To improve the developing property in an alkaline developing solution by including diazo resin having at least one specific repeating unit in the photosensitive layer.

CONSTITUTION: A photosensitive composition includes diazo resin having at least one repeating unit as expressed by the formula. In the formula, R1 denotes a hydrogen atom, alkyl group, alkoxyl group, hydroxyl group, carboxyester group, or carboxyl group that may have a substituent, and R2 denotes a hydroxyl group or a group having at least one alcoholic or phenolic hydroxyl group, and R3, R4 denote a hydrogen atom, alkyl group, or alkoxyl group respectively, and X denotes -NH-, -O-, or -S-, and Y- denotes an anion. As the R2, that which includes an OH group is preferable. By providing an OH group in the base material of diazo resin, the hydrophilic property of the resin can be enhanced, and the developing property can be improved.


Inventors:
MATSUMURA TOMOYUKI
NAKAI HIDEYUKI
KAMIMURA JIRO
MURATA MASAHISA
Application Number:
JP15282792A
Publication Date:
December 07, 1993
Filing Date:
May 20, 1992
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
MITSUBISHI CHEM IND
International Classes:
G03F7/00; G03F7/021; G03F7/027; G03F7/028; G03F7/11; (IPC1-7): G03F7/021; G03F7/00; G03F7/027; G03F7/028; G03F7/11
Attorney, Agent or Firm:
Toru Takatsuki



 
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