PHOTOSENSITIVE COMPOSITION AND PHOTORESIST DRY FILM MANUFACTURED THEREFROM

Title:

PHOTOSENSITIVE COMPOSITION AND PHOTORESIST DRY FILM MANUFACTURED THEREFROM

Document Type and Number:

Japanese Patent JP2022122290

Kind Code:

A

Abstract:

To provide a photosensitive composition and a photoresist dry film manufactured therefrom.SOLUTION: A photosensitive composition contains (a) a novel polymer binder, (b) a polymerizable compound, (c) a photoinitiator and (d) a photosensitizer. The photosensitive composition has development performance and/or peeling performance improved by similar adhesiveness and resolution.SELECTED DRAWING: None

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Inventors:

TSAI TSUNG-HAN
LIN LIYEN

Application Number:

JP2022018481A

Publication Date:

August 22, 2022

Filing Date:

February 09, 2022

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Assignee:

DUPONT ELECTRONICS INC

International Classes:

G03F7/033; C08F2/50; C08F212/06; C08F257/02; C08F290/06; C25D5/02; C25D7/00; C25D7/12; G03F7/004; G03F7/029; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Tani / Abe Patent Office

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