Title:
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE AND METHOD FOR DEVELOPING FOR THEM
Document Type and Number:
Japanese Patent JPH08278631
Kind Code:
A
Abstract:
PURPOSE: To provide a photosensitive compsn. and a photosensitive planographic printing plate having high sensitivity, excellent in adhesiveness and chemical resistance and hardly generating sludge in a developer and to provide a method for developing the printing plate.
CONSTITUTION: This photosensitive compsn. contains a photopolymerizable monomer, a compd. having a coumarin skeleton and a high molecular polymer having -CON = bonds, -SO2N = bonds or -NR2 groups (R is H or ≥1C alkyl) or contains a photopolymerizable monomer having one or more amido or amino groups, a compd. having a coumarin skeleton and a high molecular polymer.
Inventors:
HATTORI RYOJI
NAKAI HIDEYUKI
SASA NOBUMASA
KOJIMA YASUO
NAKAI HIDEYUKI
SASA NOBUMASA
KOJIMA YASUO
Application Number:
JP10804695A
Publication Date:
October 22, 1996
Filing Date:
April 07, 1995
Export Citation:
Assignee:
KONISHIROKU PHOTO IND
International Classes:
G03F7/027; G03F7/00; G03F7/031; G03F7/032; G03F7/32; (IPC1-7): G03F7/032; G03F7/00; G03F7/027; G03F7/031; G03F7/32
Attorney, Agent or Firm:
岩間 芳雄