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Title:
PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2012168526
Kind Code:
A
Abstract:

To provide a photosensitive composition curable with a small energy amount even when a substance such as a colorant attenuating or shielding an emitted light is present in high concentration or even when a film is thick.

A photosensitive composition contains the following (1) to (3): (1) a radical initiator (A), or a radical initiator (A) and an acid generator (B); (2) a base generator (C); and (3) a polymerizable substance (D). At least one of the radical initiator (A), the acid generator (B) and the base generator (C) generates active species (H) by irradiation with an actinic ray; the active species (H) is reacted with the radical initiator (A), the acid generator (B) or the base generator (C) to generate new active species (I); polymerization reaction of the polymerizable substance (D) by the new active species (I) proceeds; the active species (H) or (I) is an acid or a base; and polymerization reaction of the polymerizable substance (D) proceeds by a base generated by irradiating the base generator (C) with an actinic ray in parallel with the above polymerization reaction.


Inventors:
HIGUCHI SHINTARO
MOTOFUJI AZUSAHEI
Application Number:
JP2012014480A
Publication Date:
September 06, 2012
Filing Date:
January 26, 2012
Export Citation:
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Assignee:
SANYO CHEMICAL IND LTD
International Classes:
G03F7/029; C08F2/50; G03F7/004; G03F7/027; G03F7/032; G03F7/038; C07C25/18; C07C43/225; C07C49/84; C07C69/712; C07C211/63; C07C381/12
Domestic Patent References:
JPH10152548A1998-06-09
JP2009126974A2009-06-11
JP2009120683A2009-06-04
JP2007277114A2007-10-25
JP2007045900A2007-02-22
JP2002105110A2002-04-10
JPH09263635A1997-10-07
JP2010160419A2010-07-22
Foreign References:
WO2010095390A12010-08-26
WO2010143560A12010-12-16