PHOTOSENSITIVE COMPOSITION - NIPPON CATALYTIC CHEM IND

Title:

PHOTOSENSITIVE COMPOSITION

Document Type and Number:

Japanese Patent JP2022052084

Kind Code:

A

Abstract:

To provide a photosensitive composition that can give a cured product having excellent elastic recovery, hardness, adhesion, and durability.SOLUTION: A photosensitive composition contains a polyfunctional methacrylate of lactone-modified polyvalent aliphatic alcohol (A), a cyclization-polymerizable monomer (B), and an acyl phosphine oxide-based photopolymerization initiator (C). Preferably the photosensitive composition further contains a polymerization inhibitor (D). Preferably, the mass ratio between the polyfunctional methacrylate of lactone-modified polyvalent aliphatic alcohol (A) and the cyclization-polymerizable monomer (B) (A/B) is 1/1-10/1.SELECTED DRAWING: None

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Inventors:

KUNO MIKI
TANAKA SHINSUKE

Application Number:

JP2020158261A

Publication Date:

April 04, 2022

Filing Date:

September 23, 2020

Export Citation:

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Assignee:

NIPPON CATALYTIC CHEM IND

International Classes:

C09D4/02; C08F220/28; C09D7/63

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