PHOTOSENSITIVE FILM AND MASKING USING THE SAME - COMMISSARIAT ENERGIE ATOMIQUE

Title:

PHOTOSENSITIVE FILM AND MASKING USING THE SAME

Document Type and Number:

Japanese Patent JPS6184642

Kind Code:

A

Abstract:

Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.

Inventors:

FURANSOWA BIGEE
RUI JIRAARU
SHIYARURU ROJIRIO
FURANSOWA SHIYU

Application Number:

JP20988285A

Publication Date:

April 30, 1986

Filing Date:

September 21, 1985

Export Citation:

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Assignee:

COMMISSARIAT ENERGIE ATOMIQUE

International Classes:

C08F30/08; G03F7/038; G03F7/039; G03F7/075; G03C5/00; G03F7/26; (IPC1-7): G03C1/71; G03C5/00; G03F7/10

Attorney, Agent or Firm:

Tamio Nishiwaki

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