Title:
PHOTOSENSITIVE FILM WITH SUPPORT FILM AND PATTERNING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2020122862
Kind Code:
A
Abstract:
To provide a photosensitive film with support film, having improved dielectric constants, while maintaining high transmittance, and a patterning method using the same.SOLUTION: A photosensitive film with support film has a support film and a photosensitive resin layer provided on the support film, the photosensitive resin layer containing a binder polymer, a polymerizable compound, a photopolymerizable initiator, and metal oxide particles, the photosensitive film having a relative dielectric constant at 10 kHz of 4 or more.SELECTED DRAWING: Figure 1
Inventors:
HIRAO KOHEI
OZAWA MASAYOSHI
OZAWA MASAYOSHI
Application Number:
JP2019014267A
Publication Date:
August 13, 2020
Filing Date:
January 30, 2019
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/004; B32B27/18