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Title:
PHOTOSENSITIVE MATERIAL DEVELOPING PROCESSOR
Document Type and Number:
Japanese Patent JP3903107
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a photosensitive material developing processor whose processing time is shortened.
SOLUTION: A photosensitive material 10a having been exposed is carried by rollers in a carrying rack 28, dipped in the developer in a developing tank 21 and the bleaching and fixing solution in a bleaching and fixing tank 22, and carried to a 1st washing tank 23. The photosensitive material 10a which is carried to the 1st washing tank 23 is washed with the washing liquid in the 1st washing tank 23. Then the photosensitive material 10a is carried in liquid toward a 2nd washing tank 24 and slides between a blade 53 and a lower wall surface 62b of a slit hole part 62 by deforming the lower end of a blade 53 of an in-liquid squeezing part 40, so that the photosensitive material 10a is carried in the 2nd washing tank 24. After the photosensitive material 10a passes, the lower edge of the blade 53 comes into contact with a lower wall surface 62b of the slit hole part 62 again to stop the washing liquid from passing. Then the photosensitive material 10a passes through respective in-liquid squeezing parts 40 and is carried in the liquid in the washing tank 27.


Inventors:
Enhashi Atsushi
Ochanai
Application Number:
JP2001368330A
Publication Date:
April 11, 2007
Filing Date:
December 03, 2001
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
G03D3/13; (IPC1-7): G03D3/13
Domestic Patent References:
JP9073159A
JP9015807A
JP5027402A
JP5053259A
JP4068349A
JP4362946A
JP5188559A
JP11265049A
JP4268554A
JP11194471A
JP11194473A
Attorney, Agent or Firm:
Kazunori Kobayashi
Shigeru Iijima
Kobayashi Hideyoshi