To provide a photosensitive material processing apparatus provided with a conveying mechanism conveying a photosensitive material and a liquid dipping part for supplying processing liquid to the photosensitive material being conveyed by the conveying mechanism, wherein the liquid dipping part is provided with a friction means of rubbing a surface of the photosensitive material having been supplied with the processing liquid, wherein the photosensitive material is more efficiently processed.
The conveying mechanism TE and liquid dipping part 90 constitute an out-tank processing unit 50 which processes the photosensitive material P outside a processing tank capable of being conveyed vertically in the processing liquid, and the liquid dipping part 90 includes a discharge mechanism 91 which discharges the processing liquid a contact place between the friction means and the photosensitive material P.
URA HIRONAGA
Mountain Saki Tetsuya
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