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Title:
PHOTOSENSITIVE MATERIAL PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2007178617
Kind Code:
A
Abstract:

To provide a photosensitive material processing apparatus provided with a conveying mechanism conveying a photosensitive material and a liquid dipping part for supplying processing liquid to the photosensitive material being conveyed by the conveying mechanism, wherein the liquid dipping part is provided with a friction means of rubbing a surface of the photosensitive material having been supplied with the processing liquid, wherein the photosensitive material is more efficiently processed.

The conveying mechanism TE and liquid dipping part 90 constitute an out-tank processing unit 50 which processes the photosensitive material P outside a processing tank capable of being conveyed vertically in the processing liquid, and the liquid dipping part 90 includes a discharge mechanism 91 which discharges the processing liquid a contact place between the friction means and the photosensitive material P.


Inventors:
WADA HIROAKI
URA HIRONAGA
Application Number:
JP2005375647A
Publication Date:
July 12, 2007
Filing Date:
December 27, 2005
Export Citation:
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Assignee:
NORITSU KOKI CO LTD
International Classes:
G03D3/00; G03D3/02
Attorney, Agent or Firm:
Shuichiro Kitamura
Mountain Saki Tetsuya