To provide a photosensitive material processing apparatus that is free from coating defects and is usable with the developability being stable for a long period of time, particularly processes a sensitive material having a width of not less than A3 wide size stably without causing the coating defects.

The photosensitive material processing apparatus at least has: a pipe arrangement having at least elasticity; a branch pipe for branching the pipe arrangement in two directions; a process liquid supply pipe drilled with a plurality of discharge ports; and a resistance member for applying a pressure loss to the process liquid delivered to the process liquid supply pipe. The apparatus also has a process liquid supply unit for supplying the process liquid branched by the branch pipe to both ends of the process liquid supply tube through the resistance member, and for making the process liquid flow downward from the plurality of discharge ports of the process liquid supply tube toward a diffusion film.