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Title:
PHOTOSENSITIVE MATTER
Document Type and Number:
Japanese Patent JPS6017445
Kind Code:
A
Abstract:
Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

Inventors:
EDOUIN AASAA CHIYANDOROSU
ERUSA REIHIMANISU
KURETASU UORUTAA UIRUKINSU JIY
Application Number:
JP8520584A
Publication Date:
January 29, 1985
Filing Date:
April 28, 1984
Export Citation:
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Assignee:
AMERICAN TELEPHONE & TELEGRAPH
International Classes:
C07F7/18; C07J51/00; C08K5/32; C08L33/00; C08L33/02; C08K5/00; G03C1/72; G03C5/08; G03F7/004; G03F7/039; G03F7/20; H01L21/027; (IPC1-7): G03C1/72; C08K5/32; G03C5/08; G03F7/10; H01L21/30
Domestic Patent References:
JPS4847320A1973-07-05
JPS55164824A1980-12-22
JPS57198450A1982-12-06
Attorney, Agent or Firm:
Masao Okabe (2 outside)