To provide a photosensitive paste which is useful to form a fine barrier rib pattern, a dielectric pattern, an electrode pattern and a black matrix pattern of a plasma display panel, suppresses thickening and gelatinization, and excel in storage stability, and to provide a baked substance pattern formed using the paste.

The photosensitive paste comprises (A) inorganic fine particles other than boric acid, (B) a carboxylic resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, (E) boric acid having a mean particle diameter (D50) of ≤20 μm and (F) a hydrophobic solvent. Preferably the paste further comprises (G) a polyhydric alcohol.