PURPOSE: To enable the easy formation of the photosetting film with a low exposure by uniformly dissolving photosensitive arom. polyamide and a photopolymn. initiator into an org. solvent essentially consisting of a specific polyether compd..
CONSTITUTION: The photosensitive arom. polyamide and the photopolymn. initiator are uniformly dissolved at 1 to 50wt.% concn. into the org. solvent contg. ≥50wt.% polyether compd. expressed by formula R-O-(C2H4-O-)n-R(where (n) is 3 to 4; R is a lower alkyl group). The photosensitive polyamide compsn. (soln. compsn.) is applied on a base material and the coating is dried to form the photosensitive thin film (dry film) contg. the photosensitive arom. polyamide and the photopolymn. initiator. The film is photoset by photoirradiation. The photosensitive arom. polyamide is uniformly dissolved and is not easily gelatified in such a case.
NISHIO KAZUAKI
WATANABE HIDEAKI
