Title:
PHOTOSENSITIVE POLYMER AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3609326
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photosensitive polymer and a chemical amplification type photoresist composition containing the photosensitive polymer.
SOLUTION: The photosensitive polymer is obtained using a norbornene ester having a bonded 1-12C aliphatic alcohol group and maleic anhydride as basic monomers. The chemical amplification type photoresist composition containing the photosensitive polymer has high etching resistance, is excellent in adhesion characteristics to a lower film and has high wettability to a developing solution.
Inventors:
Chung Higashi
Cui Ai Shun
Lee Hajime
Lee Shu
Cui Ai Shun
Lee Hajime
Lee Shu
Application Number:
JP2000231006A
Publication Date:
January 12, 2005
Filing Date:
July 31, 2000
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C08F220/18; C08F222/06; C08F232/04; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; C08F220/18; C08F222/06; C08F232/04; G03F7/004
Domestic Patent References:
| JP10316720A | ||||
| JP10218947A | ||||
| JP10153864A | ||||
| JP10130340A | ||||
| JP11160877A | ||||
| JP11002903A | ||||
| JP2000292917A | ||||
| JP11286469A | ||||
| JP2000235263A | ||||
| JP11279122A | ||||
| JP2000206683A | ||||
| JP2000086726A | ||||
| JP2000086725A | ||||
| JP11255840A |
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani