Title:
PHOTOSENSITIVE POLYMER COMPRISING ALKYL VINYL ETHER COPOLYMER AND RESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3805988
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a photosensitive polymer comprising an alkyl vinyl ether copolymer and a resist composition containing the same.
SOLUTION: The photosensitive polymer comprises an alkyl vinyl ether/ maleic anhydride copolymer represented by formula I [wherein X is a linear or cyclic alkyl vinyl ether bearing either structure selected from structural formulae II and III (wherein (y) is 1-4; R1 is hydrogen atom or methyl group; R2 is a 1-20C hydrocarbyl group; and R3 is hydrogen atom or a 1-3C alkyl or alkoxy group)].
Inventors:
Choi Shun
Kim Kenyu
Kim Kenyu
Application Number:
JP2001012171A
Publication Date:
August 09, 2006
Filing Date:
January 19, 2001
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C08F216/14; G03F7/027; C08F218/04; C08F220/18; C08F222/06; C08F226/06; C08F232/04; C08K5/00; C08K5/16; C08L29/10; C08L33/06; C08L35/08; C08L45/00; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): C08F216/14; C08F220/18; C08F222/06; C08F232/04; C08K5/00; C08K5/16; C08L29/10; C08L33/06; C08L35/08; C08L45/00; G03F7/039; H01L21/027
Domestic Patent References:
| JP7242790A | ||||
| JP11194494A | ||||
| JP10153864A | ||||
| JP2001163928A |
Other References:
MAN JUNG HAN,TAE JPPN CHO AND SHIN JOON PARK,Synthesis, Characterization, and Biological Activity of Polyanion-cis-diammineplatinum(II) Complexes,Journal of BIOACTIVE AND COMPATIBLE POLYMERS,1992年,7巻/4号,358-369
加茂文三・蔵重修二・古沢至誠,2,3-ジヒドロフランの共重合,工業化学雑誌,1970年,73巻/3号,580-586
加茂文三・蔵重修二・古沢至誠,2,3-ジヒドロフランの共重合,工業化学雑誌,1970年,73巻/3号,580-586
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura