Title:
PHOTOSENSITIVE POLYMER, DISSOLUTION SUPPRESSANT AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3847315
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a dissolution suppressant having high dry etching resistance and excellent adherence to an film material.
SOLUTION: The dissolution suppressant is a tricyclodecane derivative or a sarsasapogenin derivative, each having a group which causes a chemical reaction under the action of an acid as a functional group.
Inventors:
Cui Ai Shun
Application Number:
JP2004375645A
Publication Date:
November 22, 2006
Filing Date:
December 27, 2004
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
G03F7/039; C08F32/04; C08K5/15; C08K5/17; C08L45/00; C09D137/00; G03F7/004; H01L21/027; (IPC1-7): G03F7/039; H01L21/027
Domestic Patent References:
| JP5127370A | ||||
| JP10307401A | ||||
| JP10025262A |
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii