Title:
PHOTOSENSITIVE POLYMER HAVING FLUORINATED ETHYLENE GLYCOL GROUP AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2008163347
Kind Code:
A
Abstract:
To provide a photosensitive polymer which improves characteristics of a resist such as a high transmittance and good dry etching resistance and which can form a fine pattern.
The photosensitive polymer having the structural formula can solve the above problem, wherein R1 is a hydrogen atom or a methyl group, R2 is a 3-10C hydrocarbon group having a fluorinated ethylene glycol group, R5 is a hydrogen atom, hydroxy group, 1-10C hydrocarbon group, or 1-10C fluorinated hydrocarbon group, and m/(m+o)=0.1-0.6, and o/(m+o)=0.4-0.9.
Inventors:
SANG-JUN CHOI
MOON JU-TAE
WOO SANG-GYUN
YOON KWANG-SUB
SONG KI-YONG
MOON JU-TAE
WOO SANG-GYUN
YOON KWANG-SUB
SONG KI-YONG
Application Number:
JP2008050068A
Publication Date:
July 17, 2008
Filing Date:
February 29, 2008
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
C08F212/14; C08F20/26; C08F220/10; C08F220/26; C08F220/42; C08F232/04; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JPH0558068A | 1993-03-09 | |||
| JP2001048943A | 2001-02-20 |
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Katsuyuki Utani
Yasuo Nara
Katsuyuki Utani