Title:
PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP3889685
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive polymer containing a hydroxyalkyl vinyl ether monomer unit, and a resist composition using the same.
SOLUTION: The photosensitive polymer has a weight-average molecular weight of 3,000-50,000 and contains an alkyl vinyl ether monomer unit described by the formula, (wherein x is a 3-6 integer, R1 and R2 are each a 1-20C alkyl group, 1-10C fluoroalkyl group, or 1-10C perfuluoroaklyl group, respectively).
Inventors:
Cui Ai Shun
Application Number:
JP2002245183A
Publication Date:
March 07, 2007
Filing Date:
August 26, 2002
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C08F216/14; C08F220/12; C08F222/00; C08F232/08; G03F7/004; G03F7/027; G03F7/039; H01L21/027; (IPC1-7): C08F216/14; C08F220/12; C08F222/00; C08F232/08; G03F7/039; H01L21/027
Domestic Patent References:
| JP2002317016A | ||||
| JP2002293840A |
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Previous Patent: KNITTING MACHINE HAVING ONE OR MORE PATTERN GUIDE BARS
Next Patent: CLEANING DEVICE, PROCESSING CARTRIDGE, AND IMAGE FORMING APPARATUS
Next Patent: CLEANING DEVICE, PROCESSING CARTRIDGE, AND IMAGE FORMING APPARATUS