Title:
PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTIVE FILM, AND ELEMENT HAVING THE PROTECTIVE FILM
Document Type and Number:
Japanese Patent JP2016194686
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive polysiloxane composition good in adhesive properties upon printing, a protective film, and an element having the protective film.SOLUTION: Provided is a photosensitive polysiloxane composition comprising: polysiloxane (A); o- naphthoquinonediazide sulfonate (B); and a solvent (C). The polysiloxane (A) being a polycondensate of monomer components, and the monomer components include: a titanium-containing compound (a-1) and a silane monomer represented by formula (2). The titanium-containing compound (a-1) is selected from the group consisting of a compound represented by formula (1-1) and a hydrolyzable titanium dimer: Ti(R)(R)formula (1-1) and Si(R)(OR)(2) formula (2).SELECTED DRAWING: None
Inventors:
WU MING-JU
SHI SHUNAN
SHI SHUNAN
Application Number:
JP2016065096A
Publication Date:
November 17, 2016
Filing Date:
March 29, 2016
Export Citation:
Assignee:
CHI MEI CORP
International Classes:
G03F7/075; C08G77/58; C08G79/00; C08K5/42; C08L83/08; C09D7/12; C09D183/02; G03F7/023
Domestic Patent References:
JPH03288857A | 1991-12-19 | |||
JPH03260653A | 1991-11-20 | |||
JP2007163846A | 2007-06-28 | |||
JP2014199919A | 2014-10-23 | |||
JP2011128385A | 2011-06-30 | |||
JP2014178672A | 2014-09-25 | |||
JP2007122029A | 2007-05-17 | |||
JP2011123450A | 2011-06-23 |
Foreign References:
WO2013012068A1 | 2013-01-24 | |||
WO2014058018A1 | 2014-04-17 | |||
US20050196699A1 | 2005-09-08 |
Attorney, Agent or Firm:
Kenji Sugimura
Yamaguchi Yusuke
Hirota Taura
Yamaguchi Yusuke
Hirota Taura
Previous Patent: アルミニウムを含有するアジュバント組成物およびこれを含むワクチン組...
Next Patent: A manufacturing method of an anisotropic optical film
Next Patent: A manufacturing method of an anisotropic optical film