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Title:
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE FILM USING SAME
Document Type and Number:
Japanese Patent JPH0996905
Kind Code:
A
Abstract:

To provide a photosensitive resin compsn. having improved adhesion to a base metal, less liable to undercutting by etching and useful for the precision working of a metal and to obtain a photosensitive film using the compsn.

This photosensitive resin compsn. contains a polymer binder (A) contg. (meth)acrylic acid, an alkyl (meth)acrylate and a (meth)acrylate having an amino group as constituent monomers, a monomer (B) having at least one polymerizable ethylenically unsatd. bond in one molecule and a photopolymn. initiator (C) represented by formula I or II as essential components. In the formula I, X is halogen and R is aryl or substd. aryl. In the formula II, each of R1-R4 is alkyl, amino, alkylamino, hydroxyl, aryl, halogen, benzyl or morpholino.


Inventors:
KAWAGUCHI TAKU
KIMURA JINKO
Application Number:
JP25588695A
Publication Date:
April 08, 1997
Filing Date:
October 03, 1995
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/004; G03F7/027; G03F7/028; G03F7/029; G03F7/033; (IPC1-7): G03F7/029; G03F7/004; G03F7/027; G03F7/028; G03F7/033
Attorney, Agent or Firm:
Hirose Akira



 
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