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Title:
PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURE OF PATTERN AND ELECTRONIC PARTS BY USING SAME
Document Type and Number:
Japanese Patent JP2000214586
Kind Code:
A
Abstract:

To provide a photosensitive resin composition easy in its manufacturing method and especially, excellent in storage stability by incorporating a specified ammonium salt and a specified polyimide precursor.

This photosensitive resin composition contains the ammonium salt represented by the formula (a) R4N+A- and (b) the polyimide precursor, and in the formula, each of R4 is, independently, a hydrocarbon group, and A- is an acid anion for forming an ionic bond with R4N+ and it is an acid anion of a nitric or picric or carboxylic or sulfonic acid, and the ammonium compound (a) is obtained by neutralizing an aqueous acid solution shown by H-A with R4NOH and then, removing water. The photosensitive polyimide precursor is obtained by forming an amide bond of tetracarboxylic acid anhydride or its derivative with diamine. The (a) component is used in an amount of 0.01-10 pts.wt. to 100 pts.wt. of the (b) component.


Inventors:
KOMATSU HIROSHI
Application Number:
JP1839299A
Publication Date:
August 04, 2000
Filing Date:
January 27, 1999
Export Citation:
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Assignee:
HITACHI CHEM DUPONT MICROSYS
International Classes:
H01L21/312; C08G73/00; C08K5/19; C08L79/08; C09D5/00; G03F7/004; G03F7/037; (IPC1-7): G03F7/037; C08G73/00; C08K5/19; C08L79/08; C09D5/00; G03F7/004; H01L21/312
Attorney, Agent or Firm:
Yukihiko Takada (1 outside)