To provide a composition of excellent film property reducing coloring and the change of film strength with the lapse of time, and a highly reliable electronic device having a pattern with excellent shape and a characteristic.

The present invention relates to the photosensitive resin composition containing (a) a polyimide resin having a specified repetition unit, (b) a compound generating a sulfonic acid when irradiated with light, and (c) a crosslinking agent having an alkoxymethyl or acyloxymethyl group on a nitrogen atom, a pattern manufacturing method using the composition, and the electronic device having the pattern.