Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2004264728
Kind Code:
A
Abstract:
To provide a photosensitive resin composition which significantly shows the effect of properties when a pattern with high color density or a black matrix pattern in a black color is formed by using a photosensitive resin composition containing a coloring agent of high concentration.
The photosensitive resin composition contains a compound (E) expressed by formula (1).
Inventors:
NAKAI HIDEYUKI
INOUE MASAHITO
MURO SEIJI
INOUE MASAHITO
MURO SEIJI
Application Number:
JP2003056808A
Publication Date:
September 24, 2004
Filing Date:
March 04, 2003
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C08F2/50; G02B5/00; (IPC1-7): G03F7/004; C08F2/50; G02B5/00
Domestic Patent References:
| JPS62174204A | 1987-07-31 | |||
| JP2004012820A | 2004-01-15 | |||
| JP2004137152A | 2004-05-13 | |||
| JPH11231120A | 1999-08-27 | |||
| JPH02157761A | 1990-06-18 | |||
| JPS6462310A | 1989-03-08 | |||
| JPS6459289A | 1989-03-06 | |||
| JPS63249840A | 1988-10-17 | |||
| JPS61176921A | 1986-08-08 | |||
| JPS61174541A | 1986-08-06 | |||
| JPS5680041A | 1981-07-01 |
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto
Toru Nakayama
Masayuki Enomoto
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