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Patent Searching and Data


Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2011227133
Kind Code:
A
Abstract:

To provide a photosensitive resin composition which is free from halogen compound in its compounds and exhibits good fire resistance and has anti-insulation reliability (anti-migration resistance), adhesion property, heat resistance, flexing resistance and solvent resistance, a photosensitive film using the photosensitive resin composition and a laminate.

The photosensitive resin composition includes polyimide resin precursor, a photosensitive agent and at least one phosphazene compound selected from a group of straight-chain phenoxyphosphazene compounds and cyclic phenoxyphosphazene compounds.


Inventors:
KATO AKIHIRO
Application Number:
JP2010094058A
Publication Date:
November 10, 2011
Filing Date:
April 15, 2010
Export Citation:
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Assignee:
ASAHI KASEI E-MATERIALS CORP
International Classes:
G03F7/004; C08G79/04; G03F7/023; G03F7/037; H01L21/027; H05K3/28
Attorney, Agent or Firm:
Hiroyoshi Aoki
Amada Masayuki