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Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2878039
Kind Code:
B2
Abstract:

PURPOSE: To provide a photosensitive resin compsn. having good sensitivity and light-shielding property after cured.
CONSTITUTION: This photosensitive resin compsn. is prepared by adding C.I pigment black 7, C.I. pigment blue 15.6, C.I. pigment red 177 and C.I. pigment yellow 139 as the light-shielding dyestuff, to methacrylic acid/methyl methacrylate copolymer (25/75wt% ratio), pentaerithritor tetraacrylate, diethylthioantone, mihillers ketone, 2-(o-chlorophenyl)-4,5-diphenylimidazolyl dimer, and ethylene glycol monoethyl ether acetate, kneading the mixture, and filtering. The obtd. resin compsn. is applied on a glass substrate 1, heated and dried. Then a 10% aq. soln. of polyvinylalcohol is applied by spin coating, heated and dried to form a photosensitive resin layer 2. The photosensitive layer is exposed to light and developed with 0.5% aq. soln. of sodium carbonate.


Inventors:
UCHIGAWA KYOSHI
KOMANO HIROSHI
AOYAMA TOSHIMI
OOTA KATSUYUKI
Application Number:
JP22199192A
Publication Date:
April 05, 1999
Filing Date:
July 29, 1992
Export Citation:
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Assignee:
TOKYO OKA KOGYO KK
International Classes:
G02F1/1335; G03F7/00; G03F7/004; G03F7/105; G03F7/11; G02B5/20; (IPC1-7): G03F7/004; G03F7/004; G02B5/20; G03F7/105; G03F7/11
Domestic Patent References:
JP4190362A
JP413106A
JP57148740A
JP5289336A
Attorney, Agent or Firm:
Tomiho Inamoto (3 outside)