Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP3240769
Kind Code:
B2
Abstract:
PURPOSE: To obtain a new photosensitive resin compsn. excellent in water developing property, showing small swelling during water development, little decrease in strength or dimensional change, and excellent strength of a resin plate after exposure, and having good breaking elongation, impact resistance, transparency, and excellent balance in characteristics.
CONSTITUTION: This compsn. contains the following components (1)-(5) (1) Granular diene polymers having a crosslinking structure and containing carboxyl groups. (2) (a) Polymer having two or more photopolymerizable unsatd. groups at the end of the molecular chain and if necessary, having photopolymerizable unsatd. groups, carboxyl groups, hydroxyl groups, amino groups, or epoxy groups in side chains of the molecular chain, or (b) non-diene polymer having photopolymerizable unsatd. groups, carboxyl groups, hydroxyl groups, amino groups, or epoxy groups in side chains of the molecular chain, or straight-chain diene polymer having low mol.wt. (3) Photopolymerizable unsatd. monomers. (4) Amino group-contg. compd. (5) Photopolynan. initiator.
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Inventors:
Katsuo Koshimura
Takayoshi Tanabe
Takashi Nishioka
Hozumi Sato
Noboru Ohshima
Takayoshi Tanabe
Takashi Nishioka
Hozumi Sato
Noboru Ohshima
Application Number:
JP22273893A
Publication Date:
December 25, 2001
Filing Date:
August 17, 1993
Export Citation:
Assignee:
JSR Corporation
International Classes:
C08F2/48; C08F279/00; C08F279/02; C08F290/00; C08F299/00; C09D4/00; C09D11/10; C09J4/00; C09J113/00; G03F7/00; G03F7/028; G03F7/038; G03F7/20; H01L21/027; (IPC1-7): G03F7/038; C08F2/48; C08F279/02; C08F299/00; C09D4/00; C09D11/10; C09J4/00; C09J113/00; G03F7/00; G03F7/028
Domestic Patent References:
| JP55143557A | ||||
| JP54110287A | ||||
| JP6107749A | ||||
| JP5150451A |
Attorney, Agent or Firm:
Toshiaki Fukuzawa