Title:
感光性化学増幅レジスト化学物質およびプロセスを使用する方法および技術
Document Type and Number:
Japanese Patent JP7009568
Kind Code:
B2
Abstract:
The disclosure herein describes methods for Photosensitized Chemically Amplified Resist Chemicals (PS-CAR) to pattern light sensitive films on a semiconductor substrate. In one embodiment, a two-step exposure process may generate higher acid concentration regions within a photoresist layer. The PS-CAR chemicals may include photoacid generators (PAGs) and photosensitizer elements that enhance the decomposition of the PAGs into acid. The first exposure may be a patterned EUV exposure that generates an initial amount of acid and photosensitizer. The second exposure may be a non-EUV flood exposure that excites the photosensitizer which increases the acid generation rate where the photosensitizer is located on the substrate. The distribution of energy during the exposures may be optimized by using certain characteristics (e.g., thickness, index of refraction, doping) of the photoresist layer, an underlying layer, and/or an overlying layer.
Inventors:
Kakashi, Michael A
Fugue, Joshua S
Russack, Benjamin M
Seiji Nagahara
Fugue, Joshua S
Russack, Benjamin M
Seiji Nagahara
Application Number:
JP2020127121A
Publication Date:
January 25, 2022
Filing Date:
July 28, 2020
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G03F7/38; G03F7/11; G03F7/20
Domestic Patent References:
| JP2013003167A | ||||
| JP2013140319A | ||||
| JP10083947A | ||||
| JP1234852A | ||||
| JP2013057877A | ||||
| JP2000194141A | ||||
| JP2015172741A |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Shinsuke Onuki
Tadahiko Ito
Shinsuke Onuki
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