Title:
PHOTOSETTING COMPOSITION FOR FORMING ELASTIC RESIN LAYER, ELASTIC RESIN LAYER, AND SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2019189775
Kind Code:
A
Abstract:
To provide a photosetting composition capable of forming an elastic resin layer having sufficient elasticity with good curability while suppressing generation of wrinkles.SOLUTION: There is disclosed a photosetting composition for forming an elastic resin layer containing (A) an elastomer having a polystyrene chain, (B) monofunctional linear or branched alkyl (meth)acrylate, (C) monofunctional (meth)acrylate having an alicyclic group, (D) bi- or higher functional polymerizable compound having 2 or more ethylenic unsaturated group, and (E) a polymerization initiator. The (E) polymerization initiator contains (E-1) an intramolecular cleavage type photo-radical polymerization initiator, and (E-2) a hydrogen withdrawing type photo-radical polymerization initiator.SELECTED DRAWING: None
Inventors:
IMAZU HIROKI
SHIBATA TOMOAKI
OTAKE SHUNSUKE
TENDO KAZUYOSHI
SHIBATA TOMOAKI
OTAKE SHUNSUKE
TENDO KAZUYOSHI
Application Number:
JP2018085650A
Publication Date:
October 31, 2019
Filing Date:
April 26, 2018
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C08F2/50; C08F2/44; C08F287/00; H01L23/29; H01L23/31
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshinori Shimizu
Hiroyuki Hirano
Hideki Okita
Yoshinori Shimizu
Hiroyuki Hirano
Hideki Okita