To provide a photoresist composition which reduces problems with a VOC (volatile organic compound) to the utmost, which has improved productivity and which exhibits excellent heat resistance, water resistance, electric characteristics and developing property when it is hardened, and to provide its hardening method.
The photosetting resin composition comprises (A) acid group-containing photopolymerizable resin, (B) a photopolymerizable resin having a polymerizable unsaturated group and a decomposing hydrophilic group, wherein the blending weight ratio of (A) to (B) ranges from 50:50 to 10:90, (C) a reactive monomer, (D) a photopolymerization initiator, and (E) an acid generating agent. The method for hardening the composition is also presented.
YAMADA TAKATOSHI
IMAHASHI SATOSHI
