Title:
PHOTOSETTING SILICON COMPOUND COMPOSITION
Document Type and Number:
Japanese Patent JPS5953494
Kind Code:
A
Abstract:
PURPOSE: A novel composition useful as an insulating film, etc., capable of being cured in a short time without using a photosensitizer to provide an odorless cured material having improved heat resistance, comprising an Si compound having an o-nitrobenzyloxy group directly linked to Si.
CONSTITUTION: A photosetting silicon compound composition comprising an Si compound [e.g., trimethyl (o-nitrobenzyloxy)silane, etc.] having an o-nitrobenzyloxy group shown by the formula [R1WR4 are H, halogen, NO2, CN, 1W5C (substituted)alkyl, 1W5C alkoxy, (substituted) aryl, aryloxy, 1W5C acyloxy, OH, mercapto, acetyl, or aryl] directly linked to Si or the Si compound and a silanol condensation catalyst (e.g., dibutyltin dilaurate, lead octenoate, etc.).
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Inventors:
HAYASE SHIYUUJI
OONISHI YASUNOBU
OONISHI YASUNOBU
Application Number:
JP16224882A
Publication Date:
March 28, 1984
Filing Date:
September 20, 1982
Export Citation:
Assignee:
TOKYO SHIBAURA ELECTRIC CO
International Classes:
C08G77/22; C07F7/10; C08G77/382; C08L83/08; G03F7/075; (IPC1-7): C07F7/10
Attorney, Agent or Firm:
Hajime Tsukuni
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