Title:
PHOTOTHERMALLY DEVELOPABLE PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP2006010922
Kind Code:
A
Abstract:
To provide a photothermally developable photosensitive material which hardly takes charges and is excellent in photographic performances, particularly antifogging.
The photothermally developable photosensitive material has a photosensitive layer containing a photosensitive silver halide, an organic silver salt and a reducing agent on one surface of a support and has a backing layer on the other surface of the support opposite to the photosensitive layer, wherein an uppermost layer on the photosensitive layer side contains a fluorocarbon polymer having a constitutional unit represented by formula (1).
Inventors:
TERANISHI MIYUKI
HOSOI YUJI
HOSOI YUJI
Application Number:
JP2004186172A
Publication Date:
January 12, 2006
Filing Date:
June 24, 2004
Export Citation:
Assignee:
KONICA MINOLTA MED & GRAPHIC
International Classes:
G03C1/76; G03C1/498