Title:
圧電素子の製造方法
Document Type and Number:
Japanese Patent JP5844026
Kind Code:
B2
Abstract:
A piezoelectric device includes a lower electrode, a piezoelectric film and an upper electrode laminated in this order on a support. An oxide film containing a material that forms a lower electrode is formed on a side surface of the piezoelectric film. The piezoelectric device is produced such that an upper electrode and a piezoelectric film are patterned by dry-etching through a mask formed on a side of the upper electrode of the piezoelectric device member and thereafter a side surface of the patterned piezoelectric film (a film adhered to a side wall) is oxidized to form an oxide film.
Inventors:
Hideharu Takahashi
Fumihiko Mochizuki
Fumihiko Mochizuki
Application Number:
JP2008072769A
Publication Date:
January 13, 2016
Filing Date:
March 21, 2008
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
H01L21/8242; H01L41/332; H01L21/3065; H01L21/316; H01L21/8246; H01L27/105; H01L27/108; H01L41/09; H01L41/18; H01L41/22; H01L41/23
Domestic Patent References:
| JP2007329285A | ||||
| JP200136024A |
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Hiroshi Fukuda
Kato Kazunori
Hiroshi Fukuda