Title:
PLASMA ETCHING ELECTRODE PLATE AND JIG
Document Type and Number:
Japanese Patent JP3118733
Kind Code:
B2
Abstract:
PURPOSE: To provide a plasma etching electrode plate and a jig which are excellent in dynamic characteristics and durability and able to carry out an etching work of high accuracy solving flaws in a conventional technique.
CONSTITUTION: A plasma etching electrode plate and a jig are formed of glass- like carbon material made from phenolic resin and polycarbodiimide. When phenolic resin is solely hardened, a large number of air bubbles are generated in burned glass-like carbon due to condensation water generated accompanying dehydration reaction, and on the other hand, when phenolic resin and polycarbodiimide resin are mixed together and hardened, not only dehydration reaction is restrained but also a hardened body uniform in quality can be obtained, and a glass-like carbon material obtained by burning the hardened body concerned is free from air bubbles and excellent in physical properties.
Inventors:
Kazuo Saito
Takeshi Ishimatsu
Takeshi Ishimatsu
Application Number:
JP17925792A
Publication Date:
December 18, 2000
Filing Date:
June 12, 1992
Export Citation:
Assignee:
Nisshinbo Corporation
International Classes:
C23F4/00; C01B31/02; C04B35/52; H01L21/28; H01L21/302; H01L21/3065; (IPC1-7): H01L21/302; C23F4/00; H01L21/28
Domestic Patent References:
| JP5320955A | ||||
| JP574658A | ||||
| JP3285086A | ||||
| JP6314453A | ||||
| JP61246245A | ||||
| JP2175756A | ||||
| JP2218750A |
Attorney, Agent or Firm:
Masato Kobayashi (1 person outside)