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Patent Searching and Data


Title:
PLASMA FOCUS DEVICE
Document Type and Number:
Japanese Patent JPS6166350
Kind Code:
A
Abstract:

PURPOSE: To reduce fluctuation of X-ray strength by applying a means for stabilizing temperature of an insulator to a plasma focus device in which plasma is generated by creeping discharge of the insulator and making amount of gas adsorbed constant.

CONSTITUTION: A plasma focus device is constructed by disposing a cylindrical anode 1 and a cathode 2 on a coaxial and insulating by an insulator 3 of glass etc, and accommodating them in a vessel 4 which is sealed by gas of neon and argon, and providing a fluid path 7 in the vicinity of the insulator 3 to circulate pure water and air and controlling the temperature of the insulator by a sensor such as a thermister. And high voltage pulse is provided between electrodes 1, 2 to generate plasma and to inject soft X-rays. Then, the temperature of the insulator 3 is stabilized to make the amount of gas adsorbed on the surface of the insulator 3 constant, and fluctuation of X-ray strength is largely reduced to improve reproduceability.


Inventors:
KATO YASUO
WATANABE YOSHIO
MURAYAMA SEIICHI
Application Number:
JP18653884A
Publication Date:
April 05, 1986
Filing Date:
September 07, 1984
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
H01J35/00; H01J35/22; H01L21/027; H05G2/00; H05H1/24; (IPC1-7): H01L21/30; H05G1/00
Attorney, Agent or Firm:
Junnosuke Nakamura