Title:
PLASMA PROCESSING APPARATUS AND DEPOSITION METHOD
Document Type and Number:
Japanese Patent JP2023025751
Kind Code:
A
Abstract:
To increase plasma density.SOLUTION: A plasma processing apparatus for depositing a film on a substrate comprises: a reaction tube provided in a processing vessel; a boat holding the substrate and carried in and out of the reaction tube; a plasma generator unit connected to the reaction tube and generating plasma from a gas; a gas supply unit supplying the gas to the plasma generator unit; an electrode installation unit installed across the plasma generator unit and having electrodes; an RF power supply connected to the electrodes and supplying RF to the electrodes; a coil installed in the electrode installation unit and separated from the electrodes; and a DC power supply connected to the coil and supplying DC current to the coil.SELECTED DRAWING: Figure 3
Inventors:
MATSUURA HIROYUKI
ANDO TAKESHI
KOBAYASHI TAKESHI
ANDO TAKESHI
KOBAYASHI TAKESHI
Application Number:
JP2021131063A
Publication Date:
February 24, 2023
Filing Date:
August 11, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/31; C23C16/505; H01L21/318; H05H1/46
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito
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