Title:
PLASMA PROCESSOR AND METHOD FOR PROCESSING PLASMA
Document Type and Number:
Japanese Patent JP2023078977
Kind Code:
A
Abstract:
To provide a technique for selectively using ions or radicals of remote plasma.SOLUTION: In a plasma processor, the inner space of a chamber is divided into a first space between an upper electrode and a shower head and a second space below the shower head, and a plurality of openings are provided to penetrate the shower head so that the first space and the second space connect to each other. A shielding part is provided between the upper electrode and the shower head and has a first shielding plate and a second shielding plate arranged in parallel to each other along the shower head, and a plurality of through-holes are arranged so that the first shielding plate and the second shielding plate are aligned with the openings of the shower head. A voltage application unit is formed to select ions or radicals of the plasma which are to pass through the plurality of through-holes by applying a control voltage on the shielding part. A control unit is formed to control the voltage application unit.SELECTED DRAWING: Figure 1
Inventors:
MATSUDO TATSUO
Application Number:
JP2021192339A
Publication Date:
June 07, 2023
Filing Date:
November 26, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H05H1/46; H01L21/3065
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Yoshiki Kuroki
Junji Kashiwaoka
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