Title:
プラズマ処理装置、プロセッサ、制御方法、非一時的コンピュータ可読記録媒体及びプログラム
Document Type and Number:
Japanese Patent JP7155354
Kind Code:
B2
Abstract:
A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.
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Inventors:
Koshimizu ground salt
Taichi Hirano
Tohru Hayasaka
Kubota Shinji
Sachiko Maruyama
Takashi Michisuga
Taichi Hirano
Tohru Hayasaka
Kubota Shinji
Sachiko Maruyama
Takashi Michisuga
Application Number:
JP2021112410A
Publication Date:
October 18, 2022
Filing Date:
July 06, 2021
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; H01L21/205; H01L21/3065
Domestic Patent References:
| JP2006304585A | ||||
| JP2016157735A |
Foreign References:
| WO2017040415A1 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito