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Patent Searching and Data


Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
Japanese Patent JPH08330095
Kind Code:
A
Abstract:

PURPOSE: To perform control on the occurrence of foreign matter following abnormal discharge with high reliability by providing a means detecting the local abnormal discharge from the rapid change of a potential and a current following the abnormal discharge.

CONSTITUTION: Material constituting a sputtering target 6 is splashed at a molecular level by ions accelerated toward the target 6, and a splash direction is provided with directivity by a collimator 8 so that a coat is formed on a board 1. The change of the output voltage of a clamp type current monitor 12 is observed by an abnormal discharge detection circuit 11. Pulse signals generated in the circuit 11 are sent to a personal computer 13 as abnormal discharge information at respective positions. On the signals from the circuit 11 occurrence times at respective positions and occurrence frequencies at respective processings are recorded by the personal computer 13 so that the transition of occurrence frequencies is shown on a display.


Inventors:
YAJIMA AKIRA
KOBAYASHI HIDE
SHIMAMURA HIDEAKI
KISHIMOTO SATOSHI
YONEOKA YUJI
NISHIHARA SHINJI
SHIDA HIROYUKI
Application Number:
JP13634495A
Publication Date:
December 13, 1996
Filing Date:
June 02, 1995
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
H05H1/46; C23C14/34; C23C16/50; C23C16/515; C23F4/00; H01L21/203; H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): H05H1/46; C23C14/34; C23C16/50; C23F4/00; H01L21/203; H01L21/205; H01L21/3065
Attorney, Agent or Firm:
Ogawa Katsuo