Title:
プラズマ処理装置
Document Type and Number:
Japanese Patent JP5334914
Kind Code:
B2
Abstract:
A tendency for a discontinuity to occur in the amount of power reflected back to an r.f. bias source of a vacuum plasma processor is overcome by controlling the r.f. bias source output power so the power delivered to plasma in a vacuum processing chamber remains substantially constant. The r.f bias source output power is changed much faster than changes in capacitors of a matching network connecting the r.f. bias power source to an electrode of a workpiece holder processor. A capacitive impedance component of the plasma is determined by optically measuring the thickness of a plasma sheath in the chamber.
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Inventors:
Arthur M Hobart
John P. Holland
Christopher Olson
John P. Holland
Christopher Olson
Application Number:
JP2010114452A
Publication Date:
November 06, 2013
Filing Date:
May 18, 2010
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H01L21/205; H05H1/00; C23F4/00; H01J7/24; H01J37/32; H01L21/302; H01L21/3065; H01L21/31; H03H7/40; H05B31/26; H05H1/46
Domestic Patent References:
| JP8195385A | ||||
| JP10154600A | ||||
| JP3224226A | ||||
| JP10070109A | ||||
| JP1199430A | ||||
| JP10241895A |
Foreign References:
| WO1999014855A1 | ||||
| WO1998047168A1 |
Attorney, Agent or Firm:
Seitaka Yoshida