Title:
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2012212803
Kind Code:
A
Abstract:
To provide an oxide film removal method capable of removing an oxide film at a high speed by irradiating an oxide film formed on an object to be treated with hydrogen radical of larger than a required amount for separating oxygen atoms included in an oxide film, and eliminating damage to the object to be treated or the like by adjusting temperatures of plasma containing the hydrogen radical.
A coating formed by bonding atoms of a surface of an object to be treated with at least one type of oxygen atoms, nitrogen atoms, or sulfur atoms is irradiated with plasma generated by applying a voltage to plasma generation gas to remove the oxygen atoms, nitrogen atoms, or sulfur atoms contained in the coating.
Inventors:
OKINO AKITOSHI
MIYAHARA SHUICHI
SASAKI RYOTA
KABURAGI YUIKI
MIYAHARA SHUICHI
SASAKI RYOTA
KABURAGI YUIKI
Application Number:
JP2011078120A
Publication Date:
November 01, 2012
Filing Date:
March 31, 2011
Export Citation:
Assignee:
OKINO AKITOSHI
MIYAHARA SHUICHI
MIYAHARA SHUICHI
International Classes:
H01L21/3065; B08B7/00; C23F4/00
Domestic Patent References:
| JP2007227297A | 2007-09-06 | |||
| JP2003051490A | 2003-02-21 | |||
| JP2005235464A | 2005-09-02 | |||
| JP2002008895A | 2002-01-11 | |||
| JP2002110613A | 2002-04-12 | |||
| JP2001168075A | 2001-06-22 |
Attorney, Agent or Firm:
Shunsuke Nakao
Takashi Ito
Yoshimi Hatanaka
Naoko Okura
Fumari Tamari
Takeyuki Suzuki
Takashi Ito
Yoshimi Hatanaka
Naoko Okura
Fumari Tamari
Takeyuki Suzuki
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