Title:
プラズマ反応器
Document Type and Number:
Japanese Patent JP5178725
Kind Code:
B2
Abstract:
A plasma reactor has high durability with performance to generate stable and uniform plasma. The reactor has a variety of advantages such as increasing the range of commercial applications since the reactor has a structure that allows simple and efficient installation and operation in a system at a position required by the system. The reactor includes a stack constructed by sequentially stacking plus and minus electrodes and spacers and a reactor body provided at one side of the stack to hold the stack. The plus and minus electrodes are arranged alternately with spacers to define passages through which gas is allowed to pass. Each of the plus and minus electrodes has deformation preventing means to disperse stress of the electrodes and to prevent a local thermal stress caused by thermal expansion and contraction, thereby increasing thermal shock-resistant performance. External terminals for connection to the plus and minus electrodes are provided on the reactor body. A projection is formed on a surface of the reactor body in a direction perpendicular to a stack direction of the stack to allow the reactor to be easily fixed to a case.
Inventors:
Min, Hunshik
Ann, Yang Geun
Yang, Sun Jin
Ann, Yang Geun
Yang, Sun Jin
Application Number:
JP2009528168A
Publication Date:
April 10, 2013
Filing Date:
August 10, 2007
Export Citation:
Assignee:
CMTECH CO.,LTD.
International Classes:
H05H1/24; B01J19/08; F01N3/01; F01N3/02; F01N3/08
Domestic Patent References:
| JP2004360558A | ||||
| JP7263119A |
Foreign References:
| WO2004054703A1 | ||||
| WO2005001250A1 |
Attorney, Agent or Firm:
Ryoichi Takaoka
Takashiro Kojima
Noriko Kawai
Ikuo Kobayashi
Takashiro Kojima
Noriko Kawai
Ikuo Kobayashi